SMG offers an Equivalent to New (ETN) Remote Plasma Source Refurbishment Program for deposition and etch chamber clean processes for Semiconductor and other critical thin film applications.
MKS’ ASTRON® 2L (AX7657 ), 3L (7670 Series) remote plasma sources are critical subcomponents for deposition and etch chamber clean processes, removing process by-product build-up from chamber walls, increasing the life of a process tool and reducing the source of thin film contamination.
MKS’ ASTRON® 2L (AX7657 ), 3L (7670 Series) remote plasma sources are critical subcomponents for deposition and etch chamber clean processes, removing process by-product build-up from chamber walls, increasing the life of a process tool and reducing the source of thin film contamination.




